Cymer Demonstrates 25 Watts of Average EUV Power for 1 1/2 Hours; Completes Development...

Wed May 14, 2008 8:00am EDT

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Cymer Demonstrates 25 Watts of Average EUV Power for 1 1/2 Hours; Completes Development of EUV Manufacturing Facility

    EUV Milestone and Facility Build-Out Support Industry's Future
                     Goals and Technology Roadmap
SAN DIEGO--(Business Wire)--
Cymer, Inc. (Nasdaq:CYMI), the world's leading supplier of light
sources used in semiconductor lithography, announced this week at the
Sematech EUV Source Workshop in New York that it has reached a
milestone 25 watts of average extreme ultraviolet (EUV) power
continuously for 1 1/2 hours duration, and is on track to achieve the
100 watts of average power needed for the first-scheduled delivery of
production-ready EUV lithography tools in 2009. Additionally, Cymer
announced the completion of its EUV manufacturing facility located in
San Diego, a reflection of the company's leadership and dedication to
its lithography tool and chipmaker customers, who will rely on EUV
technology to advance the semiconductor industry. The first pilot EUV
sources are currently being assembled and tested in this new facility.

   Throughout its EUV system research and development, Cymer has
demonstrated a consistent track record of source improvement. In
November 2007, Cymer became the first in the industry to achieve 100
watts of EUV burst power, which confirmed the ability to reach high
energy conversion efficiency (CE) from 10.6 micron drive laser to 13nm
EUV output. With this high CE, Cymer then focused development on
increasing the duty cycle of the source, and by doing so, demonstrated
35 watts of average EUV power for a few seconds in February. Cymer has
now achieved a continuous run of its source for 1 1/2 hours at an
average power of 25 watts, marking a significant milestone toward
meeting the industry's production requirements.

   "Just three months after achieving 35 watts of EUV power for a
short burst, Cymer has made significant progress in reaching 25 watts
of average EUV power for more than one hour," said Ed Brown, president
and chief operating officer for Cymer. "This power and duration
achievement paired with the completion of our EUV manufacturing
facility reflects Cymer's commitment to EUV and the commercialization
of future lithography tools."

   For more than a decade, the world's foremost scientists at Cymer
have been developing the critical light source customers will need to
launch EUV into production. Cymer has reached all of its EUV power
performance milestones using a laser-produced plasma (LPP) system
consisting of a multi-staged carbon dioxide laser and tin droplet
target, which has been in operation since June 2006. In the first
quarter of 2007, Cymer also disclosed a breakthrough in debris
mitigation technology that will substantially extend the lifetime of
the multi-layer mirror collector - a key component of the source
system, enabling an economically viable cost of operation. These rapid
advancements in technology validate the LPP architecture's ability to
scale to high-volume manufacturing performance requirements.

   For additional information and/or images about Cymer's progress in
EUV, please contact Kelly Hamor at 619.234.0345 or
hamor@formulapr.com.

   Forward Looking Statements

   Statements in this press release that are not strictly historical
in nature are forward-looking statements. These statements include,
but are not limited to references to Cymer achieving 100W of constant
power with its EUV source and the first delivery of these sources in
2009; the industry's reliance on EUV technology, and meeting the
industry's production requirements; a debris mitigation breakthrough
enabling economically viable cost of operation; and the scalability of
LPP technology to high volume manufacturing performance requirements.
These statements are based only on current information and
expectations that are inherently subject to change and involve a
number of risks and uncertainties. Actual events or results may differ
materially from those projected in these statements due to various
factors, including but not limited to: the possibility that
development of Cymer's EUV technology may not continue to make rapid
progress, or that a competing technology will displace EUV on the
semiconductor industry's roadmap; or that the EUV source does not
perform as anticipated; cyclicality in the semiconductor equipment
industry; the demand for semiconductors in general, and, in
particular, for leading-edge devices with smaller geometries; the rate
at which semiconductor manufacturers take delivery of photolithography
tools from the company's customers; delays or cancellations by
customers of their orders; new and enhanced product offerings by
competitors; the timing of customer orders, shipments and acceptances;
inability by the company to meet its production and/or product
development schedules; inability of the company to secure adequate
supplies of critical components for its advanced products; and failure
by the company to manage its expense levels and unanticipated
expenses. For a discussion of these and other factors which may cause
our actual events or results to differ from those projected, please
refer to the company's most recent annual report on Form 10-K and
quarterly reports on Form 10-Q, as well as other subsequent filings
with the Securities and Exchange Commission. You are cautioned not to
place undue reliance on these forward-looking statements, which speak
only as of the date of this press release. All forward-looking
statements are qualified in their entirety by this cautionary
statement, and the company undertakes no obligation to revise or
update any forward-looking statements to reflect events or
circumstances after the date of this press release.

   About Cymer

   Cymer, Inc. is a leading supplier of DUV laser illumination
sources the essential light source for DUV photolithography systems.
The company has been committed for more than two decades to providing
advanced lithography tools to its worldwide base of valued customers.
DUV lithography is a key enabling technology, which has allowed the
semiconductor industry to meet the exacting specifications and
manufacturing requirements for volume production of today's advanced
semiconductor chips. Further information on Cymer may be obtained from
the Company's SEC filings, the Internet at www.cymer.com or by
contacting the company directly.

Cymer, Inc.
Terry Slavin, Director, Corp. Comm. & IR
858-385-5232
TSlavin@cymer.com
or
Formula
Kelly Hamor
619-234-0345
Hamor@formulapr.com

Copyright Business Wire 2008
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