Renesas Technology Adopts Stratosphere Solutions' StratoPro-STX(TM) Variability Characterization Platform for 45nm

SUNNYVALE, CA, Sep 02 (MARKET WIRE) --
Stratosphere Solutions, Inc., a leading provider of semiconductor IP and
analysis tools that reduce the impact of variability on performance and
parametric yield, today announced that Renesas Technology Corp., one of
the world's leading semiconductor system solutions providers for mobile,
automotive, and PC/AV (Audio Visual) markets, has selected
StratoPro-STX(TM) variability characterization platform for their 45
nanometer advanced SoC technology development and production usage.

Random and systematic process variability is a significant cause of
parametric yield loss and higher design margins at 65nm and 45nm.
Deterministic physical models and basic process characterization methods
of using simple devices or a few ring oscillators are not sufficient to
improve parametric yield. Using StratoPro-STX, engineers incorporate
complex devices within their characterization infrastructure, extract
within-die statistics such as mean and 3-sigma and pin-point the exact
location of any failing device while minimally using scarcely available
tester resources. StratoPro-STX results empower engineers to rigorously
characterize variability during technology development, ramp parametric
yield, and model local, global, and random variations.

"At 45nm nodes and below, a test vehicle that provides high resolution
measurements consuming lowest test time within a very small area per
reticle is a must-have for characterizing variability and developing
accurate statistical models," said Yasuo Yamaguchi, Chief Engineer, SOC
Device Technology Dept., Production Technology Development Div. at Renesas
Technology Corp. "We looked at various solutions and decided that
Stratosphere Solutions' StratoPro-STX(TM) silicon IP platform meets our
requirements and fits well within our existing tools infrastructure and
methodology. StratoPro allows our engineers to be in full control of
proprietary process data, retain technical know-how, and continuously
drive parametric yields higher."

"We are excited that Renesas has selected our StratoPro-STX(TM) product
for 45nm parametric variability characterization," said Prashant Maniar,
Chief Strategy Officer, Stratosphere Solutions, Inc. "Renesas is
emblematic of our typical customer, where our product empowers internal
engineering teams to be more productive and reduce cost of ramping up
parametric yield in the subsequent development cycles. Renesas has been
an excellent early adopter partner and we are delighted to add Renesas to
our growing IDM and fab-lite customer list."

About Stratosphere Solutions

Stratosphere Solutions, Inc. is the leading provider of an innovative
parametric yield & performance improvement solution including a
silicon-proven IP platform and modeling applications empowering customers
to reduce impact of variability on performance and parametric yield. Its
customer base includes leading worldwide semiconductor companies building
products utilizing processes from 130nm to 45nm. For additional
information, visit www.stratosol.com.

Contact:
Hitendra Divecha
408-215-0074 x 9662
divechah@stratosol.com

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