Chartered Adopts Brion`s Computational Lithography Solutions

SANTA CLARA, Calif.--(Business Wire)--
Brion Technologies, an ASML company, has reached a multi-year agreement with
Chartered Semiconductor Manufacturing Ltd., one of the world`s top dedicated
semiconductor foundries, to implement a broad suite of computational lithography
products. Chartered will use Tachyon OPC+ (optical proximity correction),
Tachyon LMC (lithography manufacturability check), and Tachyon resolution
enhancement products to design and manufacture 45-nanometer (nm) and below
technology node devices.

Brion`s Tachyon products will help Chartered optimize its ASML scanners to
provide a comprehensive lithography solution with optimal cost of ownership.
Brion will work with Chartered to implement Tachyon computational products to
deliver larger manufacturing process windows resulting in improved line width
control for higher yield.

Meeting the imaging requirements of advanced technology nodes will require the
effective use of increasingly complex Resolution Enhancement Techniques (RET).
Chartered will have access to Brion`s double-patterning solutions such as
Tachyon DPT litho double patterning and several RET and computational
lithography solutions. Brion`s double patterning options allow Chartered to
select the optimum combination of techniques for each design and every layer,
which help to minimize lithography costs.

"Chartered is committed to providing its customers with robust and
cost-effective manufacturing solutions. ASML`s and Brion`s integrated suite of
lithography products for process development, mask design and litho
manufacturing enables Chartered to offer advanced technology solutions that are
optimized for higher yields," said Liang Choo Hsia, senior vice president of
technology development at Chartered.

"Brion is excited to work with Chartered and help it address the increasing
challenges of advanced semiconductor manufacturing," said Jim Koonmen, general
manager of Brion. "We offer the broadest and most powerful range of
computational lithography products and look forward to a long and mutually
beneficial relationship with Chartered."

About Computational Lithography

Computational lithography is the use of computer modeling to predict, correct,
optimize and verify imaging performance of the lithography process over a range
of patterns, processes, and system conditions. For an overview of computational
lithography products, a video entitled "virtual scanning for smarter chips" is
available on www.asml.com. Additional information on computational lithography
can also be found on asml.com and brion.com.

About Brion Technologies

Brion Technologies is a division of ASML and an industry leader in computational
lithography for integrated circuits. Brion`s Tachyon platform, a source mask
optimization, OPC and OPC verification system, enables capabilities that address
chip design, photomask making and wafer printing for semiconductor
manufacturing. Brion is headquartered in Santa Clara, California. For more
information: www.brion.com

About ASML

ASML (NASDAQ:ASML)(Amsterdam:ASML) is the world's leading provider of
lithography systems for the semiconductor industry, manufacturing complex
machines that are critical to the production of integrated circuits or chips.
Headquartered in Veldhoven, the Netherlands, ASML is traded on Euronext
Amsterdam and NASDAQ under the symbol ASML. ASML provides systems and service to
chip manufacturers in more than 60 locations in 15 countries. For more
information: www.asml.com

© 2009 Brion Technologies. All rights reserved. Brion Technologies, the Brion
Technologies logo, and Tachyon are trademarks of Brion Technologies.

ASML
Media Relations:
Corporate Communications
Ryan Young, +1 480-383-4733
Tempe, Arizona
or
Lucas van Grinsven, +31 40 268 3949
Veldhoven, the Netherlands
or
Investor Relations:
Craig DeYoung, +1 480-383-4005
Tempe, Arizona
or
Franki D`Hoore, +31 40 268 6494
Veldhoven, the Netherlands

Copyright Business Wire 2009