Pall Corp. and Lewis University Expand Research on Interaction between Nanoparticles and Filter Media

Tue Mar 5, 2013 1:20pm EST

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Insights Presented at International Forum Can Help in the Development and
Selection of New Chemical Mechanical Polishing Filtration Products
PORT WASHINGTON, N.Y.--(Business Wire)--
Building on earlier teamwork with Lewis University, Pall Corporation (NYSE:PLL)
today announced that scientists from both organizations have expanded research
into optimizing filtration technology for chemical mechanical planarization
(CMP) operations, a critical step in the manufacture of microchips. With the
advent of new slurries containing ever finer nanoparticles, filtration is
critical to removing oversized, defect-causing particles while allowing the
unhindered passage of the active, small particles. The study was designed to
elucidate differences in adsorption characteristics of silica and ceria
particles, which are common abrasives in CMP slurry, to filter media. The
results can provide guidance when designing filtration for specific slurry
types, or when recommending specific filter grades or modes of usage in order to
maximize filtration efficiency and service life. 

A paper on the Pall/Lewis University research, "The Role of Abrasive Type and
Media Surface Energy on Nanoparticle Absorption," was recently presented by
Vivien Krygier, Ph.D., senior vice president of Pall Microelectronics marketing,
at the International Conference on Planarization/CMP Technology (ICPT) in
Grenoble, France. The conference is an international forum for academic
researchers, industrial practitioners and engineers from around the world to
share research in CMP technology. 

For the second year in a row, Lewis University undergraduate student Jordan
Kaiser and Jason Keleher, Ph.D., assistant professor of Chemistry, have
collaborated with Patrick Levy, product manager at Pall Corp., and Patrick
Connor, Ph.D., associate director at Pall Corp., on nanoparticle/filtration
research. The research focused on gaining mechanistic insight centered on the
synergy between nanoparticles and filtration media exhibiting modulated surface
energy. Results revealed a significant difference in particle/filter media
interaction occurring under conditions that simulate actual capture of abrasive
particles or their agglomerates in a depth filter. 

Pall Microelectronics supports customers in the semiconductor, data storage,
fiber optic, display, and solar energy materials industries with innovative
detection, filtration, and purification products, and deep applications
expertise, for chemical, gas, water, chemical mechanical polishing (CMP) and
photolithography processes. 

To learn more about Pall`s solutions for semiconductor manufacturers, please
visit:
http://www.pall.com/main/Microelectronics/Chemical-Mechanical-Polishing-Filtration-54166.page.


About Pall Corporation

Pall Corporation (NYSE:PLL) is a filtration, separation and purification leader
providing solutions to meet the critical fluid management needs of customers
across the broad spectrum of life sciences and industry. Pall works with
customers to advance health, safety and environmentally responsible
technologies. The company`s engineered products enable process and product
innovation and minimize emissions and waste. Pall Corporation is an S&P 500
company serving customers worldwide. Pall has been named a "top green company"
by Newsweek magazine. To see how Pall is helping enable a greener, safer, more
sustainable future, follow us on Twitter @PallCorporation or visit
www.pall.com/green. 

Lewis University is a Catholic university offering distinctive undergraduate and
graduate programs to more than 6,500 traditional and adult students. Lewis
offers multiple campus locations, online degree programs, and a variety of
formats that provide accessibility and convenience to a growing student
population. Sponsored by the De La Salle Christian Brothers, Lewis prepares
intellectually engaged, ethically grounded, globally connected, and socially
responsible graduates. The seventh largest private not-for-profit university in
Illinois, Lewis has been nationally recognized by The Princeton Review and U.S.
News & World Report. Visit www.lewisu.edufor further information.

Pall Corporation
Marie (MacLean) Baron
Director, Pall Industrial Global Marketing Communications
516-801-9282
Mobile: 516-492-1462
Marie_Baron@pall.com
or
Lewis University
Kathrynne Skonicki
Director of Media Relations
815-536-5711
Mobile: 815-210-6305
skonicka@lewisu.edu



Copyright Business Wire 2013

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