ASML and Cymer Announce Advancement in EUV to Enable Manufacturing of Integrated...

ASML and Cymer Announce Advancement in EUV to Enable Manufacturing of
Integrated Circuits for Years to Come
CYMER SHIPS WORLD'S FIRST LPP EUV LITHOGRAPHY SOURCE TO ASML

VELDHOVEN, Netherlands and SAN DIEGO, July 13 /PRNewswire/ -- ASML (Nasdaq:
ASML) and Cymer, Inc. (Nasdaq: CYMI) formally announce the shipment of the
world's first fully integrated laser-produced plasma (LPP) Extreme Ultraviolet
(EUV) lithography source to ASML. Cymer's EUV source, the first of a
multi-unit purchase agreement between the two companies, is currently being
installed at ASML's Veldhoven headquarters where it will support integration
and testing of next generation EUV lithography scanners.

Together with this shipment, Cymer announces achieving a record milestone of
75 watts of EUV lithography exposure power (full die exposure) and expects to
scale to 100 watts exposure power within the current quarter, enabling scanner
throughput of 60 silicon wafers (300 mm/12 inch) per hour which is required
for volume manufacturing with ASML's EUV technology. First shipments of
production-capable EUV scanners from ASML are planned a year from now. The
source concept will be capable of scaling over time to performance levels
consistent with exposing more than 100 wafers per hour when fully integrated
into ASML scanners.

EUV is a new lithographic method using a 15 times shorter wavelength than
current lithography systems, enabling semiconductor scaling to resolutions of
10 nanometers (nm) and smaller. EUV will support Moore's Law - the trend
towards more powerful, energy-efficient yet affordable chips -- for at least
another 10 years.

"Our team has worked hard to ship the industry's first LPP EUV lithography
source while achieving new levels of EUV power," said Bob Akins, chief
executive officer of Cymer. "We are pleased to be partnering with ASML in the
advancement of EUV lithography, which will offer high-resolution,
high-throughput, manufacturing capability for the production of advanced ICs
with critical dimensions below 22 nm, enabling the continuation of Moore's Law
for multiple chip generations to come. Within the next few years, chips
patterned by EUV lithography will be hundreds of times more powerful than
today's", concluded Akins.

"Cymer and ASML are committed to bringing EUV lithography to production
reality for chip makers worldwide," added Martin van den Brink, executive vice
president of Products and Technology at ASML. "EUV is by far the most
cost-effective volume lithography technology for more powerful future
generations of semiconductors, and our achievements show how the equipment
industry is making huge strides to the introduction of the first
production-ready EUV lithography tools in 2010. This revolutionary new
architecture provides chip makers with technology that will extend the
semiconductor shrink for another decade at least."

An LPP EUV lithography source, which produces "light" with 13.5 nm wavelength
(invisible to the human eye), represents a significant technology paradigm
shift from today's Deep Ultraviolet (DUV) lithography excimer laser sources.
In an LPP EUV source, microscopic droplets of molten tin are fired through a
vacuum chamber and individually tracked and vaporized by a pulsed high power
infrared laser--as frequently as 50,000 times per second--creating a high
temperature tin plasma point source which radiates 13.5 nm wavelength light.
A large EUV mirror collects and directs this light into the scanner where it
is patterned by a photomask and projected using a complex set of image
reduction mirrors onto a light-sensitive silicon wafer--transferring the
pattern onto the wafer.

ASML has received orders for five EUV lithographic systems from memory and
logic customers on three continents, with deliveries starting in 2010.

Forward Looking Statements
Statements in this press release that are not strictly historical in nature
are forward-looking statements. These statements include, but are not limited
to the development and potential benefits of EUV lithography and continuing
advancements in IC manufacturing; the capabilities of future chips, including
the continuation of Moore's Law; and pending orders for EUV systems. These
statements are based only on current information and expectations that are
inherently subject to change and involve a number of risks and uncertainties.
Actual events or results may differ materially from those projected in these
statements due to various factors, including but not limited to: the risks
inherent in developing new technologies; cyclicality in the semiconductor
equipment industry; the demand for semiconductors in general, and, in
particular, for leading-edge devices with smaller geometries; the rate at
which semiconductor manufacturers take delivery of photolithography tools;
delays or cancellations by customers of their orders; new and enhanced product
offerings by competitors; the timing of customer orders, shipments and
acceptances; inability by the company to meet its production or product
development schedules; and inability of the company to secure adequate
supplies of critical components for its advanced products. For a discussion of
these and other factors which may cause actual events or results to differ
from those projected, please refer to Cymer's most recent annual report on
Form 10-K and ASML's most recent annual report on Form 20-F, as well as other
subsequent filings with the Securities and Exchange Commission. You are
cautioned not to place undue reliance on these forward-looking statements,
which speak only as of the date of this press release. All forward-looking
statements are qualified in their entirety by this cautionary statement, and
neither ASML nor Cymer undertakes any obligation to revise or update any
forward-looking statements to reflect events or circumstances after the date
of this press release.

About ASML
ASML is the world's leading provider of lithography systems for the
semiconductor industry, manufacturing complex machines that are critical to
the production of integrated circuits or chips. Headquartered in Veldhoven,
the Netherlands, ASML is traded on Euronext Amsterdam and NASDAQ under the
symbol ASML. ASML has more than 6,500 employees, serving chip manufacturers in
more than 60 locations in 15 countries.

About Cymer
Cymer, Inc. is the market leader in developing light sources, used by nearly
every major chipmaker around the world as the essential light source for DUV
lithography systems. With numerous offices worldwide and company is
headquartered in San Diego, Calif. Cymer's newly launched DUV sources enable
double patterning techniques that could be used to pattern wafers with
critical dimensions as small as 22nm. The company is also leading the
industry in the development and transition to LPP EUV lithography sources.
Cymer is committed to developing and introducing new technologies that improve
the capability, productivity, and cost of ownership. Cymer maintains a Web
site to which it regularly posts press releases, Securities and Exchange
Commission report filings, and additional information about Cymer. Interested
persons can also subscribe to automated e-mail alerts or RSS feeds. Please
visit www.cymer.com.

About Moore's Law
Moore's Law predicts that the number of transistors that can be placed on a
single IC will double approximately every two years at roughly stable cost,
named after Intel founder Gordon Moore who first observed this phenomenon in
1965. His theory that this trend would continue has held true until today.

SOURCE Cymer, Inc.

ASML Media Relations, Lucas van Grinsven, Corporate Communications, +31 40 268
3949, Veldhoven, the Netherlands, or ASML Investor Relations, Craig DeYoung,
+1-480-383-4005, Tempe, Arizona, USA, or Franki D'Hoore, +31 40 268 6494,
Veldhoven, the Netherlands, all of ASML; or Cymer Media Relations, Kelly
Hamor, +1-619-234-0345, hamor@formulapr.com, or Cymer Investor Relations,
Paul Bowman, +1-858-385-5312