ASML Brion Reaches Computational Lithography Agreementwith Toshiba Corporation

SAN FRANCISCO--(Business Wire)--
Brion Technologies has reached a preferred supplier agreement with Toshiba
Corporation to implement a comprehensive suite of computational lithography
products for Toshiba`s 3X nm and 2X nm node devices.

Brion`s extensive portfolio of low k1 enabling products for immersion scanner
optimization will provide Toshiba substantial process window expansion through
the combination of Tachyon source mask optimization (SMO) and ASML`s
(NASDAQ:ASML) (Amsterdam:ASML) freeform illumination shape capability. Brion
will also provide to Toshiba, Brion`s Tachyon LMC and Tachyon OPC+ for required
resolution enhancement techniques. Together, these products enable Toshiba to
extend the use of immersion lithography to the 2X nm node.

Meeting the advanced imaging requirements of the 2X nm node will require the
effective use of increasingly complex RETs and/or Extreme Ultraviolet (EUV).
Brion will provide an entire portfolio of Tachyon computational lithography
products in order to select the best combination of techniques for each layer,
all while minimizing lithography costs.

"Brion`s uniquely fast computational lithography technology consistently gives
optimum results across the areas of process development, mask design and litho
manufacturing," said Tatsuhiko Higashiki, Senior Manager of Toshiba`s Process &
Manufacturing Engineering Center, Advanced ULSI Process Engineering Dept. II.

Bert Koek, senior vice president, Applications Product Group at ASML summarized:
"Working together with Toshiba, ASML and Brion can extend the traditional
boundaries between scanner optimization and computational lithography. In
implementing holistic lithography, Toshiba will continue with ArF immersion
lithography in a cost effective manner."

"We are excited to expand our relationship with Toshiba and to help them advance
their pioneering work in leading-edge semiconductors," said Jim Koonmen, general
manager of Brion. "In particular, we will work closely with the Toshiba team to
deploy our LithoTuner fab computational products and demonstrate the ability to
efficiently optimize each scanner in manufacturing for individual designs."

About Computational Lithography
Computational lithography is the use of computer modeling to predict, correct,
optimize and verify imaging performance of the lithography process over a range
of patterns, processes, and system conditions. For an overview of computational
lithography products, a video entitled "Virtual Scanning for Smarter Chips" is
available on www.asml.com. Additional information on computational lithography
can also be found at www.brion.com.

About ASML
ASML is the world's leading provider of lithography systems for the
semiconductor industry, manufacturing complex machines that are critical to the
production of integrated circuits or chips. Headquartered in Veldhoven, the
Netherlands, ASML is traded on Euronext Amsterdam and NASDAQ under the symbol
ASML. ASML provides systems and service to chip manufacturers at more than 60
locations in 15 countries. For more information: www.asml.com

About Brion Technologies
Brion Technologies is a division of ASML and an industry leader in computational
lithography for integrated circuits. Brion`s Tachyon platform enables
capabilities that address chip design, photomask making and wafer printing for
semiconductor manufacturing. Brion is headquartered in Santa Clara, California.
For more information: www.brion.com

ASML
Media Relations Contacts:
Lucas van Grinsven, +31 40 268 3949
Corporate Communications
Veldhoven, the Netherlands
or
Ryan Young, +1 480 383 4733
Corporate Communications
Tempe, Arizona, USA
or
Investor Relations Contacts:
Craig DeYoung, +1 480 383 4005
Investor Relations
Tempe, Arizona, USA
or
Franki D`Hoore, +31 40 268 6494
Investor Relations
Veldhoven, the Netherlands

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