Deep Photonics Releases New Picosecond Pulsed Fiber Lasers for Film Side PV Processing

Tue Jul 14, 2009 2:57pm EDT
 
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Laser Platforms Designed Specifically for Laser Scribing of Thin Film PV
Materials 
CORVALLIS, Ore.--(Business Wire)--
Deep Photonics Corp., the ultra fast fiber laser company for the semiconductor,
electronics and photovoltaic marketplace, announced the introduction of two new
fiber laser platforms - the FLP-532-PPP and the FLP-355-PPP - designed for the
photovoltaic industry. The new laser platforms feature adjustable pulse width,
pulse burst packets, and variable pulse packet frequency. The new lasers allow
for film side scribing of CIGS, a-Si and CdTe and through puts unachievable
using nanosecond lasers. The lasers are currently available and have been
shipped to OEM`s for integration with scribing tools for release this summer. 

The FLP-532-PPP and the FLP-355-PPP are visible and ultra violet lasers
combining high-power output with extended lifetime, output stability, and
reliability needed for demanding laser applications. With the introduction of
Deep Photonics` new Picosecond Packet Pulsing (P³) technology, the lasers
provide significant improvement in cold ablation of materials. P³ technology
delivers extremely accurate depth control with pulse packet energy effective for
the thin film materials currently being utilized by the solar industry. The
proprietary pulsing technology provides an optimum combination of precise,
efficient material ablation while virtually eliminating the destructive affects
due to thermal heating of adjacent material. Both laser platforms combine
benchmark performance with design innovations to deliver consistent performance
at a low operating cost. 

"PV manufacturers and equipment OEMs have specifically requested an ultra-fast,
short-pulse laser that cleanly and accurately ablates current and future
material sets at higher throughput than today`s current technology," said Joe
LaChapelle, CEO of Deep Photonics. "The FLP-532-PPP and FLP-355-PPP lasers
directly address this need. They deliver break-through performance, multiple
wavelength output, pulse-to-pulse stability and high average power. Film side
processing reduces the cost of the glass used and the cost associated with glass
defects that contribute to module defects and panel lifetime issues." 

The output characteristics of the lasers make them ideal for applications
including edge isolation, laser fired contacts, via thru contacts, front surface
contacts and thin film patterning. 

"With the 532 and 355 platforms we are bringing cold ablation processing to
photovoltaic applications," commented Dr. Mike Munroe, Director of Technology
for Deep Photonics. "The combination of ionizing photonic energy, picosecond
pulse packets, and adjustable repetition rates makes the lasers ideal for solar
cell manufacturing applications. Due to their wavelength and high peak power,
picosecond fiber lasers can remove sub-micron layers with fast plume evaporation
and without excessive heat transfer to a substrate. The laser`s high repetition
rates of energetic laser pulses require lower laser fluence than what is
necessary for nanosecond lasers. As a result, our innovative fiber laser
diminishes the heating, melting, and recasting associated with longer
wavelengths and longer nanosecond pulses. Machined features are sharper and can
be made smaller. The result is reduction in P1 shorts, decrease in P2 TCO series
resistance and a decrease in shunt conductance offering PV Thin Film
manufactures improved overall panel efficiency." 

The new 532 nm and 355 nm Deep Fiber Lasers operate at up to 10 watts and 5 watt
respectively allowing the operator to define energy delivery strategies that
feature 10-50 ps pulses grouped in packets from 10 ns up to 10 μs, variable
pulse packet frequencies 500 kHz to 50 MHz, making the laser ideal for
processing crystalline silicon (c-Si) and new advanced thin films (CdTe &
CuInSe2). 

About Deep Photonics

Headquartered in Corvallis, Oregon, Deep Photonics Corporation was founded in
2004 to develop leading-edge, high-power, ultra fast fiber lasers. The Corvallis
facility supports world-class laser functions including optical materials R&D,
laser R&D, custom laser design, and volume manufacturing activities. The company
is dedicated to become the market leader in high power, infrared, visible and UV
picosecond fiber lasers that address the existing need for ultra fast lasers in
the semiconductor manufacturing, micromachining, medical and solar industries.
The company is currently commercializing fiber laser technology for the
production of novel solid-state lasers. 





Deep Photonics
Jim Field, 541-738-8888
j.field@deepphotonics.com



Copyright Business Wire 2009

 

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