Toshiba Selects Mentor Graphics Calibre DFM Platform for its Device Extraction Flow

WILSONVILLE, Ore.--(Business Wire)--
Mentor Graphics Corporation (NASDAQ:MENT) today announced that
Toshiba Corporation has selected the Calibre(R) DFM Platform for its
Device Extraction Flow aimed at controlling manufacturing variability
at 45 nanometers (nm) and beyond.

"Taking actions at the design stage to minimize manufacturing
variability is essential to maintaining competitive advantage at
advanced process nodes," said Dr. Fumitomo Matsuoka, senior manager of
Advanced Logic Technology Department, System LSI Division at Toshiba.

Calibre solutions are helping Toshiba meet its objectives by
providing detailed device parameters based on accurate simulation of
the lithographic process window and specific device interactions at
very small geometries. Toshiba has been addressing manufacturing
variability issues with close cooperation between engineers in their
design and device divisions. Their goal was to develop an advanced
systematic device extraction flow integrated with its lithography flow
that could provide more accurate transistor models incorporating
precise effects that become significant at 45nm and smaller nodes.
Toshiba adopted the Calibre DFM platform as a key technology in its
variability-aware design methodology due to its high accuracy and
compatibility with Toshiba's overall flow.

The Calibre DFM solution includes the Calibre LFD(TM)
(Litho-Friendly Design) capability which is fully integrated with new
Calibre LVS ADP (Advanced Device Parameter) features, allowing
critical device dimensions to be extracted from the LFD-modeled
contour geometries to determine a set of equivalent effective
dimensions for the devices. The resulting device parameters, which
reflect actual as-built device shapes, can then be plugged into a
SPICE model to produce an accurate timing simulation of how the real
device will work. For drawn parameters, the Calibre LVS component is
compliant with the latest industry standard models and includes
foundry-specific models for handling advanced stress effects. The
combination of the Calibre LFD and LVS capabilities provides a
complete and integrated solution that improves SPICE simulations by
providing more accurate results that better reflect actual silicon
performance.

"Toshiba is leading the way to the next stage of DFM which
involves going beyond eliminating catastrophic defects and addressing
the issues that affect parametric yield," said Joseph Sawicki, vice
president and general manager of the Design-to-Silicon division at
Mentor Graphics. "As foundries and EDA vendors work together to
accurately model the manufacturing process at advanced nodes, we can
have a substantial impact on overall device yield and performance."

About Mentor Graphics

Mentor Graphics Corporation (NASDAQ:MENT) is a world leader in
electronic hardware and software design solutions, providing products,
consulting services and award-winning support for the world's most
successful electronics and semiconductor companies. Established in
1981, the company reported revenues over the last 12 months of over
$875 million and employs approximately 4,350 people worldwide.
Corporate headquarters are located at 8005 S.W. Boeckman Road,
Wilsonville, Oregon, 97070-7777. World Wide Web site:
http://www.mentor.com/.

(Mentor Graphics and Calibre are registered trademarks and LFD is
a trademark of Mentor Graphics Corporation. All other company or
product names are the registered trademarks or trademarks of their
respective owners.)

Mentor Graphics
Gene Forte, 503-685-1193
gene_forte@mentor.com
Sonia Harrison, 503-685-1165
sonia_harrison@mentor.com

Copyright Business Wire 2008