HamaTech`s New MaskTrack Pro System Delivers Technology for Next Generation Lithography

STERNENFELS, Germany--(Business Wire)--
HamaTech Advanced Process Equipment (APE) GmbH & Co. KG, today announced its
most advanced photomask processing system, the MaskTrack Pro, which extends the
technology of HamaTech`s highly successful MaskTrack System to Next Generation
Lithography applications; 193i 22nm half pitch (hp), Extreme Ultraviolet
Lithography (EUVL) and Nano-Imprint Lithography (NIL). Key to MaskTrack Pro is
state-of-the-art cleaning technology that delivers unmatched particle removal
down to 20nm while protecting 100% of the vulnerable mask structures and
materials.

"Without the mask the lithography process cannot begin and without a pristine,
defect-free mask at the point-of-exposure the probability of yield loss on Next
Generation Lithography processes is a fact" said Wilma Koolen-Hermkens, Chief
Executive Officer of HamaTech APE "Mask Track Pro is the first system in the
industry that can fully address zero particle and defect tolerance levels on the
mask prior to exposure. We are encouraged by the positive response received from
Semiconductor IDM`s and OEM`s that require the capabilities of the MaskTrack Pro
to eliminate a key barrier of entry for new Lithography methods."

MaskTrack Pro combines innovative cleaning technology with sophisticated
platform design for a mask integrity system ready to meet the production
challenges of 193i 22nm hp DPT, EUVL and NIL. A unique combination of physical
and chemical cleaning technologies enables customers to effectively remove
organic and inorganic contamination without damage to the vulnerable features
and material structures of the reticle. Focused Spot Cleaning TM, a feature for
the precise removal of particles in defined areas of the mask, saves significant
time after repair and eliminates the toughest overlay issues caused by backside
contamination. The new MaskTrack Pro design allows clustering of metrology
systems and pod-in-pod stocking for a holistic mask management approach
throughout the life of the mask. MaskTrack Pro`s distinctive approach to mask
integrity ensures that the mask is defect-free at exposure, offering customers a
dramatic increase in tool productivity and uptime.

Over 500 HamaTech systems, including MaskTrack, have been shipped to
semiconductor manufacturers and mask shops worldwide. For the last 20 years,
HamaTech cleaning innovation has been used to enable the photolithography
processing at every advanced technology node. Please visit us at Semicon West
2009 July 14-16th at the Moscone Center in San Francisco, California. We will be
located in booth number 1707.

About HamaTech APE

HamaTech is an established leader of semiconductor equipment. At HamaTech we
combine the latest technology with extensive know-how to provide systems that
are future-compliant. HamaTech APE GmbH & Co. KG is a wholly-owned subsidiary of
SINGULS TECHNOLOGIES AG, Kahl/Main.

Short profile SINGULUS TECHNOLOGIES

SINGULUS TECHNOLOGIES, the world leader in High Volume Manufacturing equipment
for Optical Discs CD/DVD/Blu-ray, acquired STANGL to focus on the photovoltaic
market and successfully entered the solar equipment market. The new business
area "Solar" will be expanded in the next years.

While STANGL specializes in wet-chemical processes, SINGULUS` core competence is
physical coating and atomization technology. SINGULUS` extensive know-how forms
the optimum base for development of highly cost-efficient and fully-automated
production lines.

Through its daughter company HamaTech APE GmbH & Co. KG the Semiconductor and
Magnetic Storage Industries are served. For well over 20 years, HamaTech APE is
the acknowledged world market leader for Photomask cleaning, bake and develop.

HamaTech APE GmbH & Co. KG
Tel. +49 (0)7045/41-8
Fax +49 (0)7045/41-239
or
Bernhard Krause, Corporate Communications
Tel.: + 49 (0) 6181-9828020

Copyright Business Wire 2009