Key Developments For Novellus Systems, Inc.
Novellus Systems, Inc. (NVLS.O) (Nasdaq)
Novellus Systems, Inc. Raises Lower End Of Prior Q4 2009 Guidance-Conference Call
Novellus Systems, Inc. revised its fourth quarter 2009 guidance and narrowed revenue guidance to the range of $225 million to $245 million from previous forecast of $215 million to $245 million. The Company also narrowed earnings per share (EPS) guidance to a range of $0.25 to $0.40 from previous forecast of $0.20 to $0.40. According to Reuters Estimates, analysts are expecting the Company to report revenue of $235 million and EPS of $0.32 for the same period.
Novellus Systems, Inc. Raises Q4 2009 Guidance-Conference Call
Novellus Systems, Inc. raised fourth quarter 2009 guidance for revenues to range from $215 to $245 million and earnings per share (EPS) on a non-GAAP basis to be in the range of $0.20 to $0.40 per share. According to Reuters Estimates, analysts on an average were expecting the Company to report EPS of $0.16 on revenue of $218 million for the same period.
Novellus Systems, Inc. Issues Q4 2009 Outlook Above Analysts' Estimates-Conference Call
Novellus Systems, Inc. announced that for the fourth quarter of 2009, it expects revenues to be in the range of $200 to $230 million and earnings per share (EPS) to be in the range of $0.10 to $0.20. According to Reuters Estimates, analysts on an average were expecting the Company to report EPS of $0.02 on revenue of $185 million for the same period.
Novellus Systems, Inc. Issues Q3 2009 Guidance Above Analysts' Estimates-Conference Call
Novellus Systems, Inc. announced that for third quarter of 2009, it expects revenues to come in at the $150-$180 million range and it should be able to be at a level of earnings somewhere in the range of a loss of $0.15 to potentially a breakeven. According to Reuters Estimates, analysts were expecting the Company to report EPS of $(0.24) on revenue of $141 million for the same period.
Novellus Systems, Inc.'s Sub-45nm HDP Gapfill Process Provides 3x Reduction In Median Defect Density
Novellus Systems, Inc. announced that it has developed a sub-45nm, in-situ chamber clean process on the SPEED Max High Density Plasma (HDP) CVD gapfill platform that significantly reduces defect density and out-of-control (OOC) particle events. The key components of this process include efficient NF3 delivery and optimization of SPEED Max's bright (coil-assisted) and dark (remote plasma) cleans to effectively remove film build-up from targeted locations within the process environment.
